Deposition

Principle of operation and use

The manufacture of a semiconductor component is a complex process, involving numerous steps under vacuum. The deposition process is one of them and consists in depositing a material on the wafer using several technologies: PVD (Physical Vapor Deposition), PECVD (Plasma Enhanced Chemical Vapor Deposition),...

Each technology requires a different level of Vacuum. We provide advanced and adapted Vacuum Systems generally composed of two-stage vane pumps, piston pumps and boosters.